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DIN Media GmbH Standards
Total Record : 19857
DIN 50142 : 2019
Testing of metallic materials - Flat bending fatigue test
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79.35
DIN 50154 : 2019
Tensile test on foils and strips of aluminum and aluminum wrought alloys with a nominal thickness less than 0,200 mm
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71.68
DIN 50159-1 : 2022
Metallic materials - Hardness testing with the UCI method - Part 1: Test method
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87.57
DIN 50159-2 : 2022
Metallic materials - Hardness testing with the UCI method - Part 2: Verification and calibration of the testing devices
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DIN 50162 : 1978
Testing of clad steels; determination of shear strength between cladding metal and parent metal in shear test
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27.48
DIN 50280 : 1975
Running Test on Radial Plain Bearings; General
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27.48
DIN 5031-10 : 2018
Optical radiation physics and illuminating engineering - Part 10: Photobiologically effective radiation, quantities, symbols and action spectra
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221.87
DIN 5031-11 : 2011
Optical radiation physics and illuminating engineering - Part 11: Radiometer for measuring actinic radiant quantities - Terms, characteristics and their classification
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170.56
DIN 5032-7 : 2017
Photometry - Part 7: Classification of illuminance meters and luminance meters
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55.33
DIN 5032-8 : 2017
Photometry - Part 8: Data-sheet for illuminance meters
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55.33
DIN 5033-10 : 2022
Colorimetry - Part 10: Reflectance black standard for calibration in colorimetry and photometry
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55.33
DIN 50451-1 : 2003
Determination of trace elements in liquids for use in semiconductor technology - Part 1: Determination of calcium, copper, gold, iron, potassium, silver and sodium in nitric acid by atomic absorption spectrometry
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DIN 50451-2 : 2003
Determination of trace elements in liquids for use in semiconductor technology - Part 2: Determination of calcium, chromium, cobalt, copper, iron, nickel and zinc in hydrofluoric acid by plasma emission spectroscopy
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DIN 50452-1 : 1995
Particle analysis of liquids for use in semiconductor technology by the microscopic particle determination
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38.97
DIN 50452-3 : 1995
Particle analysis in liquids for use in semiconductor technology - Part 3: Calibration of optical particle counters
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DIN 50453-1 : 1990
Gravimetric determination of etch rate of mixtures for etching silicon single crystals for use in semiconductor technology
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38.97
DIN 50453-2 : 1990
Spectrophotometric determination of etch rate of mixtures for etching silicon dioxide coatings for use in semiconductor technology
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38.97
DIN 50455-2 : 1999
Characterization of photoresists used in semiconductor technology - Part 2: Determination of photosensitivity of positive photoresists
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38.97
DIN 50460 : 1988
Determination of magnetic properties of soft magnetic materials; general, terminology and principles of measurement
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103.36
DIN 5057 : 2020
Capacity serving measures - Method for measured value recording at fill mark
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38.97
DIN 508 : 2002
Nuts for T-slots
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47.29
DIN 50905-1 : 2022
Corrosion of metals - Corrosion testing - Part 1: General guidance
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DIN 50905-2 : 2022
Corrosion of metals - Corrosion testing - Part 2: Values of corrosion with uniform corrosion attack
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63.55
DIN 50905-3 : 2022
Corrosion of metals - Corrosion testing - Part 3: Values of corrosion with non-uniform and localized corrosion attack without mechanical stresses
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DIN 50905-4 : 2018
Corrosion of metals - Corrosion testing - Part 4: Performance of chemical corrosion experiments without mechanical stresses in liquids in the laboratory
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